• 专利附录
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    • 专利摘要:
    A probe for atomic force microscopy comprising a tip for atomic force microscopy (PT1) oriented in a so-called longitudinal direction (y) and projecting from an edge (B) of a substrate (S1) in said longitudinal direction, characterized in said tip is arranged at one end of a shuttle (PJ1) fixed to said substrate at least via a first (ET) and a second (R, RA) structure, said support, at least said first support structure being a flexible structure, extending in a so-called transverse direction (x), perpendicular to said longitudinal direction and anchored to the substrate by at least one mechanical connection in said transverse direction, said support structures being adapted to allow the shuttle to move in the longitudinal direction. Atomic force microscope comprising at least one such probe.
    公开号:FR3039280A1
    申请号:FR1556945
    申请日:2015-07-22
    公开日:2017-01-27
    发明作者:Benjamin Walter；Marc Faucher
    申请人:Vmicro S A S；Centre National de la Recherche Scientifique CNRS；
    IPC主号:
    专利说明:

    The invention relates to a probe for atomic force microscopy and an atomic force microscope comprising at least one such probe.
    Atomic Force Microscopy (AFM) is a scanning microscopy technique developed since the 1980s to achieve atomic resolution. In contrast to tunneling scanning microscopy, atomic force microscopy is not limited to image formation of conductive surfaces, making it suitable for insulating, semiconductor and even biological nature. This technique finds application in many areas of pure and applied research, but also in the microelectronics industry. A general introduction to AFM principles is provided by F. J. Giessibl and C. F. Quate's article "Exploring the Nanoworld with Atomic Force Microscopy," Physics Today, December 2006, pp. 44-50.
    The essential component of a conventional atomic force microscope is a probe constituted by a recessed lever at one end and provided at the opposite end with a point oriented towards the surface of the sample to be observed. The lever generally has a length of the order of a few tens or hundreds of micrometers, and the tip a radius of curvature of a few tens or hundreds of nanometers. Such a probe, generally made of monocrystalline silicon or silicon nitride, can be manufactured by conventional photolithographic techniques at a low cost. When the tip of the probe is brought closer to a surface, it is influenced by attractive or repulsive forces of a chemical nature, van der Waals, electrostatic and / or magnetic. By measuring these forces while the tip is scanning the surface of the sample to be observed, it is possible to reconstruct an image of the latter. The measurement of the forces exerted between the tip and the sample can be effected in different ways. According to the simplest and oldest technique (static AFM) it is limited to observe, including optical means, the deflection of the built-in lever supporting the tip.
    A better sensitivity can be obtained by vibrating this lever according to one of its own bending modes, and by observing the resonance frequency variations induced by the gradients of these forces (dynamic AFM). In practice, the dynamic technique is generally preferred for observations made in vacuum or in air. This technique is less suitable for observations in a liquid medium because the vibrations of the lever are strongly damped thereby degrading the quality factor of the probe.
    It is also known to use AFM probes exploiting planar vibration modes - also referred to as "vertical movement" - which make it possible to achieve very high quality factors even in dynamic AFM in viscous media.
    For example, the article by Toshu An et al. "Atomically-resolved imaging by frequency-modulation atomic force microscopy using a quartz length-extension resonator", Applied Physics Letters 87, 133114 (2005) discloses a probe for AFM comprising a micromechanical resonator formed by a quartz beam, held in its middle by a rigid frame also in quartz, which vibrates according to an extensionnei mode. An AFM tip is glued to one end of this beam, aligned with its longitudinal axis. This resonator has a high quality factor, but also a significant rigidity which greatly limits the amplitude of the vibrations (typically less than 1 nm or at most a few nanometers). In addition, the probe is not made monolithically, which limits its miniaturization.
    The Swiss company SPECS GmbH markets an AFM probe "KolibriSensor" based on this principle.
    International application WO 2008/148951 describes a monolithic AFM probe using a ring-shaped or disk-shaped resonator that oscillates according to a volume mode (deformation in the yaws). Such a probe makes it possible to reach high frequencies, which is favorable for obtaining a high quality factor even when it is used in a viscous medium. In addition, it has less stiffness than that described by Toshu An et al., And lends itself to further miniaturization because it can be performed monolithically. However, balancing the masses attached to the resonator - essential to ensure the presence of a high quality factor mode - is tricky. In addition, it is difficult to add an electrical connection for bringing a continuous potential or an alternating signal, possibly radiofrequency, to the tip. Indeed, the conductive tracks making such a connection should necessarily pass through the anchors of the ring resonator, which are limited in number and must already bear the necessary tracks for excitation and detection of oscillations.
    In his thesis "Manufacture of high-frequency micro-resonators for atomic force microscopy on biological objects", supported at the University of Science and Technology of Lille on December 13, 2011, B. Walter (one of the present inventors) described an AFM probe comprising a tip fixed to the median region of a flexible beam which has two or four recesses, located on either side of the tip. The latter is oriented in a direction perpendicular to the longitudinal axis of the beam. The realization of such a probe is difficult because the mass of the tip disrupts its modes; in addition, it is sensitive to the position of the anchors, which must be chosen before it is possible to characterize the tip.
    Despite their structural differences, AFM probes exploiting planar vibration modes known from the prior art share a number of disadvantages, in particular their bulk. These congestion constraints are related to the fact that the AFM tip relatively exceeds the planar substrate on which the probe is made. In other words, the tip extends from the edge of said substrate over a distance that is very small relative to the width of the substrate (its largest dimension perpendicular to the tip), but also to its thickness (its smallest dimension perpendicular to the point). Because of this, the tip must be kept substantially perpendicular to the surface of the sample observed by AFM, which must be planar and smooth: any inclination greater than a few degrees, or any irregularity of the surface greater than a few micrometers, would lead to undesirable contact between the probe substrate and the sample. This greatly limits the possibilities of studying biological samples (which are generally not smooth) and simultaneously performing optical and AFM analyzes or observations of the same region of a sample.
    At first glance, one could consider alleviating these congestion constraints by using longer AFM points, or formed at the free end of long, thin beams. This poses considerable difficulties, however. Indeed, an AFM tip or beam cantilevered and extending over a relatively large length (ten times its width, or more, typically it corresponds to a few tens or hundreds of micrometers) has parasitic modes of bending can be activated unintentionally and disrupt the normal operation of the beam. In addition, in the case of a probe of the type described in WO 2008/148951, a tip too long - and therefore heavy - would disturb the elliptical deformation modes of the ring resonator.
    In the case of the aforementioned article by Toshu An et al., The tip is attached to the end of a beam of considerable length (greater than 1 mm). However, in order to prevent the excitation of the bending modes and to facilitate the bonding of the reported tip, this beam has a relatively large cross section, with dimensions of the order of 100 μm whereas the AFM tip does not exceed the beam only about ten micrometers. It is therefore the longitudinal beam carrying the tip, more than the frame that supports this beam, which introduces congestion constraints that remain relatively severe. The invention aims to overcome the aforementioned drawbacks of the prior art, and more particularly to relax the constraints of space in AFM probes with vertical movement.
    An object of the invention, making it possible to achieve this goal, is a probe for atomic force microscopy comprising a tip for atomic force microscopy oriented in a so-called longitudinal direction and projecting from an edge of a substrate in said direction. longitudinal, characterized in that said tip is arranged at one end of a shuttle attached to said substrate at least via a first and a second structure, said support, at least said first support structure being a flexible structure, extending in a so-called transverse direction, perpendicular to said longitudinal direction and anchored to the substrate by at least one mechanical connection in said transverse direction, said support structures being adapted to allow the shuttle to move in the direction longitudinal.
    According to various particular embodiments of the invention:
    Said second support structure may be a micromechanical resonator adapted to be excited in order to put said shuttle in oscillation in said longitudinal direction. More particularly, said micromechanical resonator may be chosen from a ring resonator and at least one beam anchored to the substrate by at least one mechanical connection and oriented in said transverse direction.
    Said second support structure may also be a flexible structure, extending in said transverse direction and anchored to the substrate by at least one mechanical connection.
    Said probe may also comprise at least one actuator configured to cause a displacement of said shuttle in said longitudinal direction, resulting in bending of at least said first support structure.
    Said probe may also comprise at least one actuator configured to cause a displacement of said shuttle mainly in said transverse direction, resulting in bending of at least one said support structure.
    Said probe may have a monolithic structure, at least said shuttle and said support structures being made in a surface layer, called device layer, located above a surface of said substrate.
    Said shuttle may have an elongate shape in said longitudinal direction and project from said edge of the substrate. In addition, said first support structure may be at least partly suspended beyond said edge of the substrate. Furthermore, the first support structure can be attached to the substrate by means of anchors which are also at least partly suspended beyond said edge of the substrate.
    Said probe may also comprise at least one conductive track connecting an interconnection pad, deposited on said substrate, to said tip for atomic force microscopy, via a said support structure and by said shuttle. Such a probe may also comprise two elements arranged on either side of the support structure carrying said conductive track, said elements carrying respective conductive tracks, forming a planar waveguide with the conductive track passing through said support element. .
    In a variant, the probe may comprise two elongate structures, called lateral beams, extending in said longitudinal direction on either side of the shuttle, both said shuttle and said lateral beams carry conductive tracks forming a guide of planar wave.
    The probe may also include a structure extending beyond said edge of the substrate in an oblique direction toward said atomic force microscopy tip, said structure carrying a member selected from a planar waveguide and a microfluidic channel.
    Said shuttle may carry, near or in correspondence with said tip for atomic force microscopy, a resistive element whose ends are connected to two interconnection pads deposited on said substrate by respective conductive tracks passing through said first support structure and by said shuttle.
    Said probe may comprise a thermo-optical actuator comprising a section of planar optical guide integral with said shuttle and extending in said transverse direction, as well as at least one planar optical guide arranged on the surface of said substrate and configured for injecting light in said planar optical guide section in a generally longitudinal direction.
    Said probe may also comprise a motion sensor comprising a planar optical guide section integral with said shuttle and extending in said transverse direction, as well as two planar optical guides arranged on the surface of said substrate and optically coupled to opposite ends of said section of said optical guide, the coupling force depending on the position of the optical guide section in said longitudinal direction.
    As a variant, said probe may comprise a motion sensor comprising an optical resonator integral with said shuttle, as well as at least one planar optical waveguide integral with the substrate and evanescent wave coupled with said optical resonator, the position-dependent coupling force of the shuttle, and therefore of the optical resonator, with respect to said planar optical guide, in said longitudinal direction. - At least one said support structure may have an elongate shape with hairpin bends.
    Another object of the invention is an atomic force microscope comprising at least one such probe. This microscope may also include a light source configured to generate a beam of light directed to a region of the surface of a sample interacting with the atomic force microscopy tip of said probe; and a light detection system of said scattered beam by interaction with the surface of said sample and said tip. Alternatively or additionally, this microscope may also include a conductive tip arranged to contact a region of the surface of a sample near the point for atomic force microscopy of said probe. Other characteristics, details and advantages of the invention will emerge on reading the description given with reference to the accompanying drawings given by way of example and which represent, respectively:
    FIG. 1A, a plan view of an AFM probe according to a first embodiment of the invention;
    FIG. 1B, a plan view of an AFM probe according to a variant of said first embodiment of the invention;
    Figure 1C, a detail view of the side of the probe of Figure 1A or 1B, illustrating the concept of angular size in a plane perpendicular to that of the substrate;
    FIG. 2A, a plan view of an AFM probe according to a second embodiment of the invention;
    FIGS. 2B to 2D, three detail views illustrating different AFM tip structures that can be used for making the probe of FIG. 2A;
    Figure 3 is a plan view of an AFM probe according to a third embodiment of the invention;
    FIG. 4 is a plan view of an AFM probe according to a fourth embodiment of the invention;
    FIG. 5, a plan view of an AFM probe according to a fifth embodiment of the invention;
    FIG. 6, a plan view of an AFM probe according to a sixth embodiment of the invention;
    FIGS. 7A and 7B, a plan view of an AFM probe according to a seventh embodiment of the invention;
    FIG. 7C, a plan view of an AFM probe according to a variant of said seventh embodiment;
    FIGS. 8A to 8C, three plan views of AFM probes according to three variants of an eighth embodiment of the invention;
    Figure 9 is a plan view of an AFM probe according to a ninth embodiment of the invention;
    Figure 10 is a plan view of an AFM probe according to a tenth embodiment of the invention;
    Figure 11 is a plan view of an AFM probe according to an eleventh embodiment of the invention;
    Figure 12 is a plan view of an AFM probe according to a twelfth embodiment of the invention;
    Figure 13 is a plan view of an AFM probe according to a third embodiment of the invention;
    Figure 14 is a plan view of an AFM probe according to a fourteenth embodiment of the invention;
    FIG. 15, a plan view of an AFM probe according to a fifteenth embodiment of the invention;
    FIGS. 16A and 16B, two representations of the combined use of a probe according to one embodiment of the invention and of a light beam illuminating the region of the surface of a sample interacting with the tip of this probe; and
    FIG. 17 is a view illustrating the combined use of two probes according to one embodiment of the invention, the tips of which interact with the same region of the surface of a sample, of a beam of light illuminating this region of surface and a conductive tip applying an electrical potential.
    A probe according to the invention is preferably manufactured from a SOI (silicon on insulator) type structure, comprising: a silicon substrate, denoted S1 in the figures, generally thick from 20 μm to 1 mm, preferably between 50 and 600 μm; a buried layer of SiO 2 oxide, generally of a thickness between 0.1 μm and 5 μm, preferably between 0.2 μm and 2 μm, denoted BOX; and a thin layer of silicon (thickness generally between 1 nm and 100 μm, preferably between 0.25 μm and 5 μm), called "device layer" and denoted DL in the figures ("Device Layer") ). It is also possible to make the probe on a material other than SOI, for example SiN deposited on Si. It is also possible to make certain parts of the probe in the DL on SOI and others in a material such as S13N4. or any other material having suitable mechanical properties. In practice, any material having a ratio between the Young's modulus E and the sufficiently high density of mass p (typically 1 km / s <J <12 m / s) may be suitable for implementing the equation . By way of example, for silicon J = 9 km / s and for silicon carbide J = 12 μm / s. In general, the device layer is located above a surface of the substrate, directly or by the interposition of intermediate layers (BOX in the case of an SOI structure).
    The probes according to the invention can be manufactured by quite conventional technological methods, described for example in the aforementioned thesis of B. Walter. Typically, these methods comprise an anisotropic etching step making it possible to define the components of the probe (beams, resonators, etc.) in the device layer, if appropriate, an etching of the substrate by its rear face, then an isotropic etching step. to release these elements by removing the oxide that connects them to the substrate. The tip, with a radius of curvature of the order of 10 nm, can be obtained by exposing, by a suitable etching step, crystalline planes of the device layer.
    A probe according to the invention comprises a "shuttle" element carrying at its distal end, an AFM tip extending in the longitudinal direction, beyond an edge of the substrate. The shuttle is supported by at least a first and a second support structure allowing it to reciprocate in the longitudinal direction (hence the name "shuttle") while avoiding the appearance of parasitic modes of bending, thus allowing a operating "vertical" or "in the plane", with a lower stiffness than if the shuttle itself was vibrated according to an elongation mode as in the aforementioned article by Toshu An et al.
    The longitudinal reciprocation of the shuttle may result from the excitation of a resonant oscillation mode of the probe. Alternatively, the probe may also be used without resonance; in this case, the shuttle maintains a movement in the longitudinal direction. The support structures can be dimensioned in this case to provide a very low static stiffness (0.01 to 10 N / m, for example 0.5 N / m).
    Advantageously, in order to minimize the congestion problems mentioned above, the shuttle may have an elongate shape in the longitudinal direction - it may for example be a beam, or a structure formed of beams aligned in this direction - and preferably it may be extend beyond the edge of the substrate. These characteristics are however not essential; alternatively, the shuttle may, for example, have a ring shape.
    The first support structure is a flexible structure extending mainly in a transverse direction; it may be for example a beam or a structure formed of beams aligned in this direction.
    The second support structure may be of the same type as the first, or of a different type II may for example be a micromechanical resonator, especially a ring.
    In any case, both the first and the second support structure are anchored to the support by at least one mechanical connection. For example, if they are transverse beams, they can be anchored to the substrate at their ends (or only one end) or in correspondence of a node of a bending mode.
    One or more transducers are generally provided to excite and / or detect the longitudinal oscillation mode (or, more generally, to induce a longitudinal displacement of the shuttle). However, the probe may also not contain transducers per se. An alternative possibility is to use a laser to thermally excite the resonator, and another laser to read the mechanical amplitude of the induced oscillation. It is also possible to have optical guides close to the moving parts in order to inject or recover the light of these lasers.
    FIG. 1A represents a probe SM according to a first embodiment of the invention. In this figure, and the following, the contour of the substrate S1 is represented by a thick black line, the reference B designating the edge from which the longitudinal beam P J projects; the elements etched in the DL device layer are represented in gray and the metallizations deposited above these elements are represented by hatched regions. Only in FIGS. 1A, 1B and 2A - so as not to overload the other figures - dotted lines represent the oxide layer remaining below the elements etched in the device layer; the oxide is set back from the edges of these elements (and absent below the finer elements) because it is attacked during an isotropic etching step, known as "releasing" ("releasing") in English) in the field of microelectromechanical systems (MEMS). In all the figures, the probe extends essentially in an x-y plane (the z axis corresponding to the direction of the thickness of the substrate); the y axis corresponds to what is called throughout the application the "longitudinal direction" and x to the "transverse direction".
    The probe of FIG. 1A comprises a tip PT1 made monolithically at the distal end (opposite to the substrate) of a shuttle in the form of a longitudinal beam PJ. The latter is a composite structure, formed by elementary longitudinal beams PJ1, PJ2, PJ3, PJ4, PJ5, PJ6 and PJ7, connected by transverse connection elements BPJ1, BPJ2. The probe also comprises a first support structure in the form of a transverse beam ET- formed by two parts ET1, ET2 of the same length W1 (but the lengths could also be different) and of width TE1 - and a second support structure R also making micromechanical resonator function. This second support structure comprises two subsets R1 and R2 in scale form (two transverse beams connected by cross members). It is designed to have at least one MO vibration mode at a frequency fO which gives the tip a motion along y.
    The presence of the first support structure in the form of a transverse beam ET makes it possible to use a longitudinal beam-shaped shuttle PJ longer than in the prior art (length L1, lying between the edge of the substrate and the end of the peak, between 50 and 100 pm), and thus to obtain a smaller footprint in the xy plane; this space is defined in particular by the angle Θ, formed by the two half-lines which start from the end of the tip and which are tangent to the substrate. Preferably, this angle Θ can reach or even exceed 45 °, which allows, for example, to engage the probe on a sample with a strong topography.
    In the case of FIG. 1A, the resonant element R (R1, R2) dominates the mechanical stiffness because the support beam ET is of the same length but thinner: TE1 <(TB1 + TB2). As needed, it is possible to adjust the stiffness in the opposite direction or to make them identical. In the case of FIG. 1A, R1 and R2 are two ladder structures of the same length WB1, embedded in the elements AB1 and AB2 which are integral with the substrate Si. R1 and R2 are integral with two elementary longitudinal beams PJ6 and PJ7 at the points AM1 and AM2 in particular. PJ6, PJ7, PJ4, PJ5, PJ1, PJ, PJ3 as well as BPJ1 and BPJ2 constitute a joining structure between R1, R2 and the PT1 tip. This structure transmits the movement along resonators R1 and R2 almost perfectly because it is rigid in this direction. The degree of rigidity can be changed by choosing a large thickness TJ1 longitudinal beams elementary PJ6, PJ7, or by arranging several elementary longitudinal beams parallel to each other and connected by 'bars' such as BPJ2 (in the case of Figure 1A, there are two elementary longitudinal beams of the same width TJ1, with a spacing WP1). The angular space constraints already mentioned are solved by the choice of a long length of this junction structure as well as the tip.
    As mentioned above, the transverse support beam ET (ET1, ET2), secured to the substrate by the anchors AP1, AP2, makes it possible to maintain a purely longitudinal vibration mode (according to y) and to prevent a static deformation of the longitudinal beam along z during its scanning of the surface of the sample.
    For some applications, the tip PT1 will preferably have a large area as is the case in FIG.1A. It may therefore have modes of vibration in torsion out of plane. To avoid these modes or to move them away from the frequency fO, without having to add a large mass, beams PJ1, PJ2, PJ3 are used which provide the mechanical connection with the proximal part (close to the substrate) of the structure.
    In addition to preventing the appearance of parasitic vibration modes despite the length of the longitudinal beam PJ, the transverse support structure ET provides a solution to the problem of electrical addressing of the tip PT1 or another part of the resonator . For example, in FIG. 1A the transverse half-beam ET1 has been used to support a metallic line (or more generally a conductive track) LM1 which electrically connects to a pad PL1 the electrostatic transducer T3, making it possible to excite the longitudinal oscillation. PU pad, which serves to make an electrical connection to an external device, for example by means of a probe or a micro-welded wire. The ET2 half-beam, for its part, is here used to carry a metal line LM2 connecting a PL2 pin to the tip. Alternatively or in addition, the transport structure and the shuttle could be used to pass a planar optical waveguide, to bring to the tip a guided optical signal.
    A considerable advantage of the probe of FIG. 1A compared to that described in the aforementioned document WO 2008/148951 is that, whatever the mass of the various suspended elements of the structure, the existence of the fundamental vibration mode MO where the structure is translated according to y is easy to obtain. This mode does not depend on the balancing of a mass distribution and stiffness as in WO 2008/148951 and if, by an effect of the manufacturing process, the mass of the tip changes, the mode would always be present with a frequency changed. In the case of WO 2008/148951, there would be a significant weakening of the quality factor Q, or a loss or a degeneracy of the mode. In addition, in the case of WO 2008/148951, the ring provides a very high static stiffness because it is retained by anchors of high stiffness; it can not therefore undergo static forces without the tip being degraded. In the case of the invention, on the other hand, the necessary flexibility is provided by the support structures.
    Elements 11 and T2 schematize stress transducers integrated on the beam. These can be piezoresistive or piezoelectric. Alternatively, T1 and T2 could be used to operate, piezoelectrically or thermally, the oscillation mode of the longitudinal beam, and the electrostatic transducer T3, interdigitated comb-shaped, to be used to detect this oscillation. These same transducers can be used to actuate or detect a non-resonant displacement of the shuttle. Although the case of a comb-shaped electrostatic transducer has been considered here, any type of capacitive transducer (planar capacitance, interdigitated ...) or opto-mechanical can be used to excite the probe according to a vibration mode. , or to impose a non-vibratory displacement.
    It may be interesting to note that, in appearance, the structure of the probe of Figure 1A recalls that of the device described in WO 2005/121812 A1, "multiaxis capacitive transducer and manufacturing method for producing it". However, the latter device is an electromechanical probe, and not an AFM probe. As such:
    It has a bandwidth much too low-less than 10 kHz while the AFM requires an oscillation frequency of at least 50 kHz;
    He is much too tall and heavy; I! is not designed to be used as a resonator, its parasitic modes are therefore not controlled,
    The structure illustrated in FIG. 1A makes it possible to release only the constraints of space in the plane xy, expressed by the angle Θ. On the other hand, that of FIG. 1B also makes it possible to release the constraints of space in the plane yz, expressed by the angle φ (see FIG. 1C). Preferably, this angle φ can reach or even exceed 45 °. The structure of FIG. 1B differs from that of FIG. 1A in that the anchors AP1, AP2 of the transverse beam ET are integral with the substrate SI only on part of their surface, while another part, as well as the transverse beam itself, extends cantilevered beyond the edge B of the substrate ("partial anchors"). This is made possible by the fact that, provided a sufficient width is used for AP1 and AP2, the portion of each projecting anchor has a stiffness in the plane xy very important in front of that of ET. Thus this anchoring, imperfect in the general case, at any frequency, proves to be sufficient as regards the mode of vibration of interest at a particular frequency.
    FIG. 2A illustrates a probe according to a second embodiment of the invention always involving a tip PT1 made monolithically at the end of a shuttle in the form of a longitudinal beam in two parts PJ1 and PJ2 (which this time , does not have a composite structure because the tip at its end is much thinner and lighter) and a first support structure in the form of transverse beam ET (half-beams ET1, ET2) attached to two partial anchors AP1, AP2, guiding while reducing the size dictated by the angles 0 and φ. In this embodiment, the second support structure is a ring-shaped resonator RA, capable of providing a higher frequency than the beam resonator R. This ring is anchored for example internally, by means of beams. PA connected to an A5 anchorage not released at its center. It can also be anchored outside using PA beams and anchors A1, A2, A3, A4. The ring can be used in an elliptical fashion (mentioned in WO 2008/148951); in this case it is advantageous to at least partially balance this mode by means of an ECM mass compensation element associated with stiffness compensation elements ECR (transverse beams), attached to anchors ACM1, ACM2. By choosing the dimensions of these elements, it will be possible to achieve similar amplitudes for the two ring portions whose displacements along y are in phase. The transducers are not represented. These may be electrostatic, piezoelectric, thermal, piezoresistive, or optomechanical transducers (see for example: 5. Tallur, SA Bhave, "Partial Gap Transduced MEMS Optoacoustic Oscillator Beyond Gigahertz", Journal of Microelectromechanical Systems No. 99, 2014) integrated near or on the ring. Instead of a ring, it is possible to use a disk or a resonator of any shape.
    To electrically interconnect the tip PT1 can use two metal deposits - one, M1, made "at the front", on the top of the tip and connected to the conductive track LM1, the other, M2, "to the 'back', on the underside of the tip, obtained by returning the structure to make a deposit after release of the longitudinal beam. The interconnection of these two metal deposits can be obtained by a deposit M1L on the side of the longitudinal beam, made by vaporizing metal at an angle relative to the normal to the substrate (FIG. 2B), by filling a hole with a metal ( "Via") VM12 achieved by etching before release of the beam (Figure 2C) or by doping conductor a region of the beam near the tip (Figure 2D, where the doped silicon is identified by a chessboard texture). These different possibilities are represented in FIGS. 2B and 2C,
    The probe of FIG. 3 (third embodiment) is characterized essentially by the fact that the first and the second support structure ET10, ET20, both in the form of a transverse beam of non-constant section, are closely spaced and coupled by longitudinal bars B1, B2. The actuators are not represented. The shuttle P J has a rectangular frame shape with a transverse bar in a central portion.
    A probe according to a fourth embodiment is shown in FIG. 4. With respect to the probes described above, two additional characteristics are noted.
    We first notice the presence of two structures SLMM1, SLMM2 extending on either side of the first support structure in the form of transverse beam ET (and more particularly of the half-beam ET1 and its anchoring) and bearing conductive tracks LMM1, LMM2 which form, with the metallic line LM1 carried by the half-beam ET1 and extending up to the conductive tip PT1, a planar microwave wave waveguide of the mass-signal-type. mass (we can also be satisfied with the only SLMM1 structure if partial screening of the LM1 line is sufficient). The presence of these structures is made possible by the small size in the xy plane. This makes it possible to apply a microwave signal, or more generally radiofrequency signal, to the tip and therefore very close to the sample to be studied. Symmetrical structures, but without metallization, are provided on the opposite side of the longitudinal beam, for balancing purposes.
    Then, we can notice that the two half-beams RI, R2 forming the second support structure R have hairpin bends, which reduce the stiffness without increasing the length and therefore the lateral size. Cross beams of this type, such as hairpin or meandering, can also be used in other embodiments of the invention.
    In the embodiments heretofore considered, the transverse beam support structures are anchored to the substrate at their opposite ends, and the probe is symmetrical about a longitudinal axis. This is not essential. For example, FIG. 5 illustrates a probe according to a fifth embodiment in which the two support structures, indicated by the references ETa and ETb, are beams anchored to the substrate by mechanical links at nodal points of a transmission mode. oscillation other than the extremities. Similarly, Figure 6 illustrates a probe according to a sixth embodiment in which the second support structure RIO is a transverse beam having a single recess located on one side of the probe, which is therefore non-symmetrical.
    In the embodiments heretofore considered, the probe operates in a vibration mode which imparts to the shuttle an oscillatory movement in a longitudinal direction. However, a probe according to the invention may also be used in a resonant mode which allows the tip to have a predominantly transverse movement (in the x direction). This is illustrated in FIGS. 7A-7C, in which the support structures are in the form of beams (or scales formed of beams) which deform according to a mode of bending in the plane with a large arrow in the direction y. In this probe, the shuttle comprises a beam of length 12 microns, at the end of which is the tip, and a ring of outer radius 7.8 microns. The support structures are 4 trapezoidal beams of 10 micron length. This probe has a first vibration mode at 8.6 MHz (it is assumed the use of an oriented Si substrate (100)). This mode, which produces a displacement of the tip in the direction y, can be excited for example by any transducer capable of generating stresses capable of producing a bending in the plane on at least one of the four support beams (in the mode of embodiment of the figure, four piezoelectric transducers (Q1, T20, T30 and T40) are used. On the other hand, the probe has a second mode of vibration (FIG 7B) at 15.5 MHz in which the tip oscillates mainly in the x direction, the two support beams on the right are then in phase opposition with the two beams support left. This mode can also be set in motion by flexing one of the support beams. The probe shown in fig. 7C is of the same dimensions as that of Figures 7A and 7B, but has one less beam which makes the support structure unsymmetrical. This leads to a 7.7 MHz vibration mode where the tip has a displacement with one component at a time along x and y. In general, the ratio of these components to one another can be selected by modifying the support structure, and / or the shape of the shuttle.
    In this way, shear forces can be measured between the tip and a sample with which it interacts; see the article by K. Karrai et al., Appl. Phys. Lett. 66 (14), 1995. It is also possible with a probe according to the invention to take advantage of vibration mode engineering not to use them, but to avoid them and thus to provide a measure of Quasi-static force with high bandwidth. In particular, a quasi-static approach-withdrawal curve can be realized with a repetition rate lower than the fundamental longitudinal oscillation mode frequency (for example, 15 MHz). This frequency can be that of an external actuator forming part of the microscope, the transducers integrated on the probe used to measure the quasi-static deflection of the tip in the longitudinal direction (y). In this case, the shuttle moves in the longitudinal direction in a reciprocating motion, but can not be described as oscillation in a proper mode of the micromechanical structure, because there is no resonance.
    FIGS. 8A to 8C illustrate different variants of a probe according to an eighth embodiment of the invention. It is also a probe with a conductive tip, optimized to propagate high frequency signals. Two beams PLL1, PLL2, said lateral beams, extend longitudinally on both sides of the shuttle PJ. They carry two lateral metal lines LMM10, LMM20 which form, with the central metallic line LM1 carried by the shuttle PJ, a planar waveguide of mass-signal-mass type. The pads PL1, PL2 and PL3 make it possible to connect the three metal lines to a radio frequency or microwave signal generator.
    In order to prevent the lateral metal lines LMM1, LMM2 from interfering with the oscillation of the shuttle, these lines comprise metal "bridges" PMM1, PMM2, PMM3, PMM4 which span the transverse support beam ET (EU, ET2) and the resonator R (R1, R2). These bridges are made by conventional "lift-off" or electrolytic deposition techniques. For the same reason, the signal line LM1 must be interrupted in its rear part (opposite the tip). Thus the signal propagates by capacitive coupling. In FIG. 8A, the reference CC1 denotes a coupling capacity of the signal. In FIG. 8B, reference CC2 denotes another coupling capacitance, having an interdigitated comb structure. In FIG. 8C, the reference CCS denotes another coupling capacity, of planar type by overlap.
    Alternatively, one could also:
    Have a similar structure but remove one of the masses so as to obtain a two-wire guide; and or
    Use hairpin beams (see R1 and R2 in Figure 4) and / or pass the mass around the perimeter of the beam anchors so as not to have to build bridges; and or
    Use the silicon substrate S1 to have a ground plane under all or part of the central guide and have a micro-ribbon guide; and or
    Use an additional metal layer to cover the center conductor by a bridge that is connected to LMM1 and LMM2.
    Use a metal layer on the rear face to form a micro-ribbon line on all or part of the path to be traveled for the RF wave.
    Figure 9 illustrates a probe according to a ninth embodiment of the invention. In this probe, the shuttle P J comprises two parallel longitudinal beams PJ1, PJ2 which are prolonged in the distal direction (y positive) by two convergent arms BPT1, BPT2 whose junction forms the tip PT1. The longitudinal beams PJ1, PJ2 carry conductive lines LM1, LM2 which extend up to connection pads PL1, PL2, located on the anchors of the first support structure in the form of a transverse beam, passing through the two half transverse brackets ET1, ET2. Their mechanical separation makes it possible to avoid a short electrical circuit if high voltages are used. This makes it possible to pass a current in the vicinity or in the tip in order to implement local heating, for example for Scanning Thermal Microscopy (SThM) applications. To heat the tip PT1 in silicon, the arms BPT1, BPT2 can be doped and ohmic contacts made with the metal of the line LM1; this makes it possible to have a low access resistance. In Figure 9, the regions identified by a chessboard texture are doped silicon.
    The second support structure R is a resonator composed of a beam flexing in the plane, integral with PJ1 and PJ2 at a ventral point PV1 which is the place where the greatest amplitude of movement is obtained. bending along the y axis.
    FIG. 10 illustrates a tenth embodiment which is in fact a variant of the previous embodiment, also comprising a second transverse support beam ETS, ET4 carrying metal lines LM3, LM4 connected to pads PL3, PL4 made on the anchors. This structure allows a 4-point measurement of the integrated resistance on the tip (doped semiconductor or metal). For this, the current is injected / recovered by the pads PL1 / PL2 and the potential is measured across PL3 and PL4. The elements ETS and ET4 do not prevent the existence of a mode MO because they are as flexible in the plane as ET1 and ET2.
    In the eleventh embodiment of the invention (FIG. 11), the second support structure is a micromechanical resonator R comprising a planar optical guide section TGO, and is thermo-optically actuated by optical power injection in this guide by the planar guides 6EX1, GEX2. The reading of the movement is carried out according to several possibilities based on the injection of light by planar guides GE1, GE2, GE3 located on one side and the reading by planar guides GS1, GS2, GS3 located on the other side.
    First possibility: GE2, GE3, GS1 and GS2 guides are not needed. The GE1 guide injects light into one end of TGO by evanescent coupling; at the opposite end, part of this light is recovered in GS3, still by evanescent coupling. The strength of the couplings varies with the position of TGO - and thus of the longitudinal beam PJ. Differential mounting can be done and the difference [Signal (GS1)) - (Signal (GS3)] can be measured.
    Second possibility: the guides GE1, GE3, GS1, GS3 are not necessary. Light is injected into TGO by direct coupling using GE2, and the signal variation in GS2 is measured. Here again, the strength of the (direct) couplings varies with the position of TGO - and thus of the longitudinal beam PJ.
    FIG. 12 illustrates a twelfth embodiment which is in fact a variant of the preceding embodiment, in which the light is injected by evanescent coupling from a GES1 guide into a "C" shaped guide RT1, which loops back the output of R on the input and constitutes a pseudo optical resonator ("pseudo" because the losses are quite high). Here again, the losses vary with the position of TGO - and therefore of the longitudinal beam PJ.
    To ensure a better technological yield and performance, it is possible to ensure that the part indicated by ZNL is not released (and therefore secured to the substrate). This is in no way prejudicial to MO motion of the mechanical resonator. In this embodiment, the tip PT1 is conductive and connected to a pad PU by a line LM1 passing on the transverse beam ET and the longitudinal beam PJ, but this is independent of the optical part.
    FIG. 13 illustrates a thirteenth embodiment of the invention in which the shuttle includes a looped optical resonator ROL in the form of a looped optical circuit, coupled by evanescent wave with a GES2 guide. The movements of the shuttle induce a change in the distance between the optical resonator ROL and the waveguide, and thus the optomechanical coupling. The figure illustrates a ring-shaped ROL optical resonator, but this is not essential; the resonator could also use Bragg mirrors or be a disk resonator. The shuttle may also contain only a portion of an optical resonator. The other portion is located near the shuttle. The displacements of the shuttle induce a substantial modification of the optomechanical cavity formed by the two portions.
    In the eleventh, twelfth and thirteenth embodiments, the sources and light detectors may be integrated with the probe or be separate devices.
    In the fourteenth embodiment (FIG. 14), the small size of the probe makes it possible to integrate on the same support a planar waveguide for microwaves or radio frequency GOP, for example three conductors of the mass-signal-mass type. , extending in an oblique direction in the xy plane, directed towards the AFM probe and whose signal conductor (here, the central conductor) ends with a tip PT2, not intended to oscillate but having substantially the same longitudinal position ( co-ordinate y) as the AFM PT1 tip in its idle state. Such a device can be used for Scanning Microwave Microscopy (SMM) applications.
    Alternatively, the waveguide for microwaves or radio frequency GOP could be replaced by a planar optical guide.
    In the particular case of FIG. 14, the elements ET1 and ET2 are meander or hairpin beams, which makes it possible, while maintaining a low stiffness, to give an even smaller lateral bulk to the resonator (see FIG. 4). R1 and R2 are the same as ET1 and ET2. The longitudinal beam P J and the tip PT1 are substantially identical to those of FIG. 4, but without a conductive line.
    In the embodiment of FIG. 15, the planar waveguide GOP is replaced by a microfluidic device DMF comprising a channel CF1, a zone allowing the connection to the outside world PF1, all of which makes it possible to dispense a fluid through an opening OF1 whose position is close to the tip AFM PT1. The small size of the probe will allow to regulate the position of the microfluidic device relative to the surface. An angle can be given to bring PT1 and OF1 closer together. A plurality of fluidic devices or tips can be used on the same substrate S1. Such a device makes it possible to study chemical reactions in a liquid medium by using very low doses of reagents, for example for biological diagnostic applications.
    The small size of the probes according to the invention makes it particularly possible to use them in imaging modes involving a light source SRCt which irradiates the tip PT1 and / or the surface of the sample E1 with which it interacts to image it in AFM. . In FIG. 16A, we see the advantage of having a small footprint in the plane (angle Θ small), which allows to leave an angle (90 ° - Θ) to achieve the lighting and an angle of the same opening to collect the light diffused by means of a collection system and light detection (shown in the figure by the SOI lens), Such a mounting allows for a scanning near field optical microscope (SNOM) Optical Microscope) of the non-aperture type, to perform Tip-Enhanced Raman Spectroscopy (TERS) or fluorescence-enhanced Raman spectroscopy.
    In FIG. 16B, we see the advantage of having a small footprint in the yz plane (small angle φ): the smaller φ is, the more you can tilt the probe in the yz plane at an angle φ2. This will allow to collect the light at angles that would be favored by the shape of the tip and the electromagnetic field-surface interaction.
    In the examples of FIGS. 16A and 16B, the AFM probe (reference SM) and the source / light detector SRC1 / S01 are the essential elements of a device which constitutes both an atomic force microscope and a near field microscope. optical type "without opening".
    Due to the small size of the probes according to the invention, it is possible to produce complex microscopes, opening up hitherto unthinkable perspectives. FIG. 17 illustrates, by way of example, an arrangement comprising two probes SM1, SM2 according to the invention whose tips PT1, PT2 interact with the same region of the surface of the sample E1, which region is also illuminated by a light beam (for example laser) emitted by a source SRC1, an SOI collection and detection system collecting scattered light; furthermore, a conductive tip P3 touches the surface of the sample in the immediate vicinity of PT1 and PT2 (typically less than 100 μm, or even 10 μm) in order to apply an electric potential, DC or AC. The tip P3 may be replaced by a tunneling microscopy tip and / or the number of small-area AFM probes may be greater than 2. These probes can be distributed by playing at the same time on the angles Θ and φ; in the example of the figure, the two probes are in the same plane and form angles Θ1 and Θ2 with the normal to the surface of the sample.
    权利要求:
    Claims (20)
    [1]
    A probe for atomic force microscopy comprising a tip for atomic force microscopy (PT1) oriented in a so-called longitudinal direction (y) and projecting from an edge (B) of a substrate (81) in said longitudinal direction, characterized in that said tip is arranged at one end of a shuttle (PJ1) fixed to said substrate at least via a first (ET) and a second (R, RA) structure, said support, at least said first support structure being a flexible structure, extending in a transverse direction (x), perpendicular to said longitudinal direction and anchored to the substrate by at least one mechanical connection in said transverse direction, said support structures being adapted to allow the shuttle to move in the longitudinal direction.
    [2]
    An atomic force microscopy probe according to claim 1, wherein said second support structure is a micromechanical resonator (R R1, R2, RA) adapted to be energized to cause said shuttle to oscillate in said longitudinal direction.
    [3]
    A probe for atomic force microscopy according to claim 2, wherein said micromechanical resonator is selected from a ring resonator and at least one beam anchored to the substrate by at least one mechanical link and oriented in said transverse direction.
    [4]
    4. A probe for atomic force microscopy according to one of the preceding claims, wherein said second support structure is also a flexible structure, extending in said transverse direction and anchored to the substrate by at least one mechanical connection.
    [5]
    5. Atomic force microscopy probe according to one of the preceding claims, also comprising at least one actuator (T 1, T2, GEX1, GEX2, GR) configured to cause a displacement of said shuttle in said longitudinal direction, resulting in flexion at least said first support structure.
    [8]
    8. A probe for atomic force microscopy according to one of the preceding claims, also comprising at least one actuator (HO, T20, T30, T40) configured to cause a displacement of said shuttle mainly in said transverse direction, resulting in bending of at least one said support structure.
    7. A probe for atomic force microscopy according to one of the preceding claims, having a monolithic structure and wherein at least said shuttle and said support structures are made in a surface layer (DL), said device layer, located above a surface of said substrate.
    8. Atomic force microscopy probe according to one of the preceding claims, wherein said shuttle has an elongate shape in said longitudinal direction and projects from said edge of the substrate.
    [9]
    The atomic force microscopy probe of claim 8, wherein said first support structure is at least partially suspended beyond said substrate edge.
    [10]
    10. A probe for atomic force microscopy according to claim 9, wherein said first support structure is attached to the substrate via anchors (AP1, AP2) which are also at least partly suspended beyond said edge of the substrate.
    [11]
    11. Atomic force microscopy probe according to one of the preceding claims, also comprising at least one conductive track (LM1) connecting an interconnection pad (PL1), deposited on said substrate, said tip atomic force microscopy, passing through a said support structure and by said shuttle.
    [12]
    12. A probe for atomic force microscopy according to claim 11 also comprising two elements (SLMM1, SLMM2) disposed on either side of the support structure carrying said conductive track, said elements carrying respective conductive tracks (LMM1, LMM2). forming a planar waveguide with the conductive track passing through said support member.
    [13]
    13. Atomic force microscopy probe according to one of claims 1 to 10 comprising two elongated structures, said side beams (PLL1, PLL2), extending in said longitudinal direction on either side of the shuttle, wherein both said shuttle and said lateral beams carry conductive tracks (LMM10, LMM20) forming a planar waveguide.
    [14]
    14. A probe for atomic force microscopy according to one of the preceding claims, also comprising a structure extending beyond said edge of the substrate in an oblique direction towards said point of atomic force microscopy, said structure carrying an element. selected from a planar waveguide (GOP) and a microfluidic channel (DMF).
    [15]
    15. A probe for atomic force microscopy according to one of the preceding claims, wherein said shuttle carries, near or in correspondence with said tip for atomic force microscopy, a resistive element (BPT1, BPT2) whose ends are connected to two interconnection pads (PU, PL2) deposited on said substrate by respective conductive tracks passing through said first support structure and by said shuttle.
    [16]
    16. Atomic force microscopy probe according to one of the preceding claims, comprising a thermo-optical actuator comprising a planar optical guide section (TGO) integral with said shuttle and extending in said transverse direction, and at least a planar optical guide (GEX1, GEX2) arranged on the surface of said substrate and configured to inject light into said planar optical guide section in a generally longitudinal direction.
    [17]
    17. A probe for atomic force microscopy according to one of the preceding claims comprising a motion sensor comprising a planar optical guide section (TGO) integral with said shuttle and extending in said transverse direction, and two planar optical guides ( GE1, GE2, GE3, GS1, GS2, GS3) arranged on the surface of said substrate and optically coupled to opposite ends of said optical guide section, the coupling force depending on the position of the optical guide section in said longitudinal direction.
    [18]
    18. probe for atomic force microscopy according to one of claims 1 to 16 comprising a motion sensor comprising an optical resonator (ROL) integral with said shuttle, and at least one planar optical guide (GES2) integral with the substrate and coupled by evanescent wave with said optical resonator, the coupling force depending on the position of the shuttle, and therefore the optical resonator, with respect to said planar optical guide, in said longitudinal direction.
    [19]
    19. Atomic force microscopy probe according to one of the preceding claims, wherein at least one said support structure has an elongate shape with hairpin bends.
    [20]
    20. Atomic force microscope comprising at least one probe (SM, SM1, SM2) according to one of the preceding claims.
    [21]
    An atomic force microscope according to claim 20, further comprising: a light source (SRC1) configured to generate a beam of light directed to a region of the surface of a sample interacting with the atomic force microscopy tip of said probe; and a detection system (SOI) of the light of said scattered beam by interaction with the surface of said sample and said tip.
    [22]
    22. Atomic force microscope according to one of claims 20 and 21, also comprising a conductive tip (P3) arranged to contact a region of the surface of a sample near the point of atomic force microscopy of said probe.
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    同族专利:
    公开号 | 公开日
    WO2017012927A1|2017-01-26|
    US10527645B2|2020-01-07|
    EP3325981A1|2018-05-30|
    CN108027390B|2020-07-14|
    CN108027390A|2018-05-11|
    US20180203037A1|2018-07-19|
    FR3039280B1|2019-05-17|
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    法律状态:
    2016-06-28| PLFP| Fee payment|Year of fee payment: 2 |
    2017-01-27| PLSC| Search report ready|Effective date: 20170127 |
    2017-06-28| PLFP| Fee payment|Year of fee payment: 3 |
    2018-06-28| PLFP| Fee payment|Year of fee payment: 4 |
    2020-06-25| PLFP| Fee payment|Year of fee payment: 6 |
    2021-06-24| PLFP| Fee payment|Year of fee payment: 7 |
    优先权:
    申请号 | 申请日 | 专利标题
    FR1556945|2015-07-22|
    FR1556945A|FR3039280B1|2015-07-22|2015-07-22|PROBE FOR ATOMIC FORCE MICROSCOPY WITH LOW DIMENSIONS AND ATOMIC FORCE MICROSCOPE COMPRISING SUCH A PROBE|FR1556945A| FR3039280B1|2015-07-22|2015-07-22|PROBE FOR ATOMIC FORCE MICROSCOPY WITH LOW DIMENSIONS AND ATOMIC FORCE MICROSCOPE COMPRISING SUCH A PROBE|
    CN201680052148.7A| CN108027390B|2015-07-22|2016-07-12|Compact probe for atomic force microscopy and atomic force microscope comprising such a probe|
    US15/744,033| US10527645B2|2015-07-22|2016-07-12|Compact probe for atomic-force microscopy and atomic-force microscope including such a probe|
    EP16738173.0A| EP3325981A1|2015-07-22|2016-07-12|Compact probe for atomic-force microscopy and atomic-force microscope including such a probe|
    PCT/EP2016/066549| WO2017012927A1|2015-07-22|2016-07-12|Compact probe for atomic-force microscopy and atomic-force microscope including such a probe|
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